Sunday, March 27, 2011
Rapid etching X-rayed: Physicists unveil processes during fast chemical dissolution
Rapid etching X-rayed: Physicists unveil processes during fast chemical dissolution: "ScienceDaily (Mar. 24, 2011) — A breakthrough in the study of chemical reactions during etching and coating of materials was achieved by a research group headed by Kiel physicist, Professor Olaf Magnussen. The team from the Christian-Albrechts-Universität zu Kiel (CAU), Germany, in collaboration with staff from the European Synchrotron Radiation Facility (ESRF) in Grenoble, France, have uncovered for the first time just what happens in manufacturing processes, used for the formation of metal contacts thinner than a human hair in modern consumer electronics, such as flat-screen television."
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